Method for cleaning a ceramic member for use in a system for...

Details Method for cleaning a ceramic member for use in a system for... Method for cleaning a ceramic member for use in a system for...

2005-02-15

2005-02-15

Chaudhari, Chandra (Department: 2813)

Semiconductor device manufacturing: process

Packaging or treatment of packaged semiconductor

Including contaminant removal or mitigation

C438S906000

Reexamination Certificate

active

06855576

ABSTRACT:
The present invention provides a method for cleaning a ceramic member for use in a system for producing semiconductors. The method has the step of cleaning the ceramic member with an organic acid or a weak acid. Preferably, the ceramic member is cleaned with a strong acid before the cleaning with an organic acid or a weak acid. The ceramic member may be subjected to a blasting treatment before the cleaning with an organic acid or a weak acid. According to the method, the amount of metal transferred from the ceramic member to a semiconductor may be considerably reduced.

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patent: WO 0209161 (2002-01-01), None

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