Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2007-11-27
2007-11-27
Vanoy, Timothy C. (Department: 1754)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C423S239100, C423S245100, C423S245300
Reexamination Certificate
active
10516826
ABSTRACT:
A cleaning process of exhaust gas which includes the steps of bringing the exhaust gas containing at least one of nitrogen oxides or organic solvent into contact with a cleaning agent including metal as a reductive cleaning agent component and metal oxide as an oxidative cleaning agent component or including lower valent metal oxide as a reductive cleaning agent component and higher valent metal oxide as an oxidative cleaning agent component while heating them. A cleaning process of exhaust gas containing nitrogen oxides and/or organic solvent with high and varying concentration discharged from a manufacturing process of semiconductor capable of easily cleaning at relatively low temperature and with high decomposition factor without using large-scale cleaning apparatus or a complicated structural cleaning apparatus is provided.
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Arakawa Satoshi
Ochi Koshi
Ohtsuka Kenji
Antonelli, Terry Stout & Kraus, LLP.
Japan Pionics Co., Ltd.
Vanoy Timothy C.
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