Method for chemical vapor deposition of titanium nitride films a

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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4272551, 427255, 4272555, 4272481, 427314, C23C 1600

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active

053785010

ABSTRACT:
Titianium nitride film is deposited upon a semi-conductor substrate by chemical vapor deposition of titanium tetrachloride, ammonia and a diluent at temperatures less than 550.degree. C. This is accomplished by minimizing the boundary layer thickness over the substrate.

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