Method for charging substrate to a potential

Details Method for charging substrate to a potential Method for charging substrate to a potential

2007-02-13

2007-02-13

Vanore, David A. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With target means

C250S3960ML

Reexamination Certificate

active

10942184

ABSTRACT:
A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating is substrate to a target potential.

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