Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-05-01
2007-05-01
Nguyen, Sang H. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100, C430S005000, C382S145000
Reexamination Certificate
active
10783520
ABSTRACT:
The invention applies techniques for image reconstruction from X-ray diffraction patterns on the three-dimensional imaging of defects in EUVL multilayer films. The reconstructed image gives information about the out-of-plane position and the diffraction strength of the defect. The positional information can be used to select the correct defect repair technique. This invention enables the fabrication of defect-free (since repaired) X-ray Mo—Si multilayer mirrors. Repairing Mo—Si multilayer-film defects on mask blanks is a key for the commercial success of EUVL. It is known that particles are added to the Mo—Si multilayer film during the fabrication process. There is a large effort to reduce this contamination, but results are not sufficient, and defects continue to be a major mask yield limiter. All suggested repair strategies need to know the out-of-plane position of the defects in the multilayer.
REFERENCES:
patent: 4751169 (1988-06-01), Behringer et al.
patent: 5230970 (1993-07-01), Atwood et al.
patent: 6016357 (2000-01-01), Neary et al.
patent: 6091846 (2000-07-01), Lin et al.
patent: 6322935 (2001-11-01), Smith
patent: 6335129 (2002-01-01), Asano et al.
patent: 6340543 (2002-01-01), Nagamura et al.
patent: 6438438 (2002-08-01), Takagi et al.
patent: 6684164 (2004-01-01), Chen et al.
patent: 6801650 (2004-10-01), Kikuchi et al.
patent: 6864971 (2005-03-01), Lin et al.
patent: 6967168 (2005-11-01), Stearns et al.
“Image reconstruction from electron and X-ray diffraction patterns using iterative algorithms: experiment and simulation,” Ultramicroscopy, vol. 90, Issues 2-3, Feb. 2002, pp. 171-195.
“Phase retrieval algorithms: a comparison,” Applied Optics, vol. 21, No. 15, Aug. 1, 1982, pp. 2758-2769.
Lee John H.
Nguyen Sang H.
The Regents of the University of California
Wooldridge John P.
LandOfFree
Method for characterizing mask defects using image... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for characterizing mask defects using image..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for characterizing mask defects using image... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3783914