Method for characterizing a photorepeater

Details Method for characterizing a photorepeater Method for characterizing a photorepeater

1997-10-29

2000-04-25

Rosenberger, Richard A.

Optics: measuring and testing

Lens or reflective image former testing

For optical transfer function

356372, G01B 900

Patent

active

060550457

ABSTRACT:
The present invention relates to a method for characterizing at least one photorepeater and a same set of patterns implemented on several regions of a wafer, including the steps of making a standard reticle defining at least one first series of at least three identical reference patterns, which are not aligned; successively exposing several regions of a standard wafer by varying the illumination dose from one region to another; measuring the respective dimensions of the reference patterns reproduced on the different regions of the wafer to determine, for each illumination does, the mean dimension of the reference patterns; and performing a linear interpolation of these mean dimensions.

REFERENCES:
patent: 4475811 (1984-10-01), Brunner
patent: 4759626 (1988-07-01), Kroko
patent: 5362585 (1994-11-01), Adams
patent: 5434026 (1995-07-01), Takatsu et al.
patent: 5615006 (1997-03-01), Hirukawa
Motorola Technical Developments, Oct. 1987, USA, vol. 7, pp 31-32, Stallard B.R., et al., "Exposure and Focus Scales For Optical Lithography".

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