Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1983-08-09
1985-04-09
Williams, Howard S.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
204148, 204196, 204197, C23F 1300
Patent
active
045100306
ABSTRACT:
An aluminum article is protected against electrochemical corrosive attack by an aqueous medium with which the article is at least partially in contact by the steps of observing the cathodic potential of the article relative to a reference electrode in contact with the medium; when the observed cathodic potential of said article approaches the potential at which pitting corrosion of the same is initiated, electrically connecting said article directly to a source of potential electronegative with respect to the observed potential of the article to repress the cathodic potential of said article to within the alkali corrosion range; and after the cathodic potential is repressed within the alkali corrosion range, disconnecting the article from said electronegative potential source to allow the article to gradually return to its natural cathodic potential in the medium.
REFERENCES:
patent: 3004905 (1961-10-01), Sabins
patent: 3242064 (1966-03-01), Byrne
patent: 3360452 (1967-12-01), McNulty
patent: 3622489 (1971-11-01), Dumitrescu et al.
patent: 3634222 (1972-01-01), Stephens, Jr.
patent: 3841988 (1974-10-01), Gleason
patent: 4381981 (1983-05-01), Maes
Miyashita Teruo
Yoshida Koichi
Chapman Terryence
Daniel William J.
Nippon Light Metal Company Limited
Williams Howard S.
LandOfFree
Method for cathodic protection of aluminum material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for cathodic protection of aluminum material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for cathodic protection of aluminum material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1168311