Method for carrying out a double or multiple exposure

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S046000, C355S075000, C355S077000, C430S394000

Reexamination Certificate

active

10948570

ABSTRACT:
The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.

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patent: 4982227 (1991-01-01), Suzuki
patent: 5472814 (1995-12-01), Lin
patent: 5482819 (1996-01-01), Tjhia et al.
patent: 5998068 (1999-12-01), Matsuoka
patent: 6265137 (2001-07-01), Hirukawa
patent: 6399283 (2002-06-01), Hoshi
patent: 6421111 (2002-07-01), Pierrat
patent: 2001/0028984 (2001-10-01), Yamashita et al.
patent: 2002/0127747 (2002-09-01), Maltabes et al.
patent: 2003/0087193 (2003-05-01), Okada et al.
patent: 2003/0142284 (2003-07-01), Lin
patent: 2003/0186141 (2003-10-01), Park et al.
patent: 2004/0004700 (2004-01-01), Park et al.
patent: 2004/0076889 (2004-04-01), Huang et al.

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