Method for avoiding residue on a vertical walled mesa

Details Method for avoiding residue on a vertical walled mesa Method for avoiding residue on a vertical walled mesa

1981-06-30

1983-06-21

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

148 15, 148187, 148188, C23C 1500

Patent

active

043892949

ABSTRACT:
A method for eliminating deposited residues, for example polysilicon residue, on vertical silicon dioxide sidewalls that have been reactive ion etched includes reshaping the sidewalls to have a slope of at least +30.degree. relative to the vertical direction of the sidewall.

REFERENCES:
patent: 3880684 (1975-04-01), Abe
patent: 3918149 (1975-11-01), Roberts
patent: 4007104 (1977-02-01), Summers et al.
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patent: 4073054 (1978-02-01), Kaji et al.
patent: 4076680 (1978-02-01), Kuroda
patent: 4117301 (1978-09-01), Goel et al.
patent: 4135998 (1979-01-01), Gniewek et al.
patent: 4181564 (1980-01-01), Fogarty
patent: 4326936 (1982-04-01), Jones
Eames et al., IBM Technical Disclosure Bulletin, 22(1979) #7 p. 2739.
Bondur et al., IBM Tech. Disc. Bull., 19(1977) #9 p. 3413, pp. 3415-3416.
Bennett et al., IBM Tech. Disc. Bull., 24(1981), p. 2857.

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