Method for automatically providing data for the focus...

Photocopying – Projection printing and copying cameras – Methods

Reexamination Certificate

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C355S055000, C355S053000

Reexamination Certificate

active

11057331

ABSTRACT:
A method for automatically providing data for the focus monitoring of a lithographic exposure process is disclosed. Firstly, the file for a wafer is generated, which holds at least the information of the size of the wafer, the position of a plurality of measurement pattern, the order in which the measurement patterns are captured and registered, and the alignment of the measurement pattern. Secondly, this information is stored in a master grid. Thirdly, images are acquired of the pattern of each position stored in the master grid of the generated file, wherein the image acquisition is carried out according to the order as stored. Finally, names are assigned to the acquired images.

REFERENCES:
patent: 6546125 (2003-04-01), Su
patent: 2003/0003677 (2003-01-01), Fukada
patent: 2006/0139596 (2006-06-01), Edart
Roberts, B., et al., “Optimization and Characterization of the Blazed Phase Grating Focus Monitoring Technique”, Infineon Technologies (11 pages), May 2004.

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