Method for automatic control of galvanic deposition of copper co

Details Method for automatic control of galvanic deposition of copper co Method for automatic control of galvanic deposition of copper co

1985-02-04

1986-11-25

Page, Thurman K.

Coating processes

Measuring, testing, or indicating

204 521, 427 10, C25D 338

Patent

active

046248579

ABSTRACT:
In a method for an automatic control of the galvanic deposition of copper coatings in acid copper bath by measuring a maximal current density and a continual dosing of gloss additives to the bath, the maximal current density is measured by cyclically measuring an actual voltage in the bath and compensating for eventual deviations of the actual voltage from the nominal value by an automatic dosing of the additives by means of dosing devices.

REFERENCES:
patent: 3506546 (1970-04-01), Semienko et al.
patent: 3969928 (1976-07-01), Arlow
patent: 4181582 (1980-01-01), Dahms
patent: 4315518 (1982-02-01), Sayer
patent: 4331702 (1982-05-01), Hieber et al.
patent: 4350717 (1982-09-01), Araki et al.

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