Method for assessing the optical quality of an imaging device

Details Method for assessing the optical quality of an imaging device Method for assessing the optical quality of an imaging device

1991-03-27

1992-06-30

Fields, Carolyn E.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

3561245, G01M 1100

Patent

active

051265508

ABSTRACT:
A method for assessing the optical quality of an imaging device. The method is suitable for use in an optical system comprising a source of radiation that can output a radiation beam; and, an imaging device to be tested, which imaging device can image the radiation beam to produce an imaged beam. The steps of the method comprise: sampling the imaged beam by an opaque mask defining at least two apertures, for generating local wavefront errors at a pupil position defined by a location of the mask; and, computing an optical transfer function (OTF) for the localized wavefront errors transmitted through the sampling apertures. The method has an advantage of expanding the applicability of the optical transfer function, heretofore a measure only of global imaging device performance, so that it can provide information for correcting an imaging device defect in terms of local area modifications.

REFERENCES:
patent: 3930732 (1976-01-01), Holly
patent: 4772120 (1988-09-01), Pointeau
patent: 4950878 (1990-08-01), Ulich et al.

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