Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent
1990-03-30
1991-04-23
Pianalto, Bernard
Coating processes
Measuring, testing, or indicating
Thickness or uniformity of thickness determined
427 10, 427 38, 427 47, 427164, 427166, 4272552, 427294, 427296, B05D 306
Patent
active
050099205
ABSTRACT:
Precision multilayer optical interference coating of substrates having complex topology using complementary shaped electrodes and plasma enhanced chemical vapor deposition within a chamber. The materials for the optical quality thin films are obtained from starting reactants of the form M-R where M denotes a metal atom and R denotes an organic component. These vapor phase starting reactants are brought into a reactive atmosphere of the chamber through a plurality of orifices in one of the shaped electrodes. The resulting substances are deposited as thin films upon the substrates with inherently superior scatter loss performance because of the low temperature nature and simple direct vapor-to-solid phase transformation path of the process.
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patent: 3953652 (1976-04-01), Adiss, Jr. et al.
patent: 4096315 (1978-06-01), Kubacki
patent: 4152478 (1979-05-01), Takagi
patent: 4237183 (1980-12-01), Fujiwara et al.
patent: 4579639 (1986-04-01), Enomoto et al.
patent: 4652467 (1987-03-01), Brinker et al.
"1989 Trends in Optical Coatings," by A. Thelen, in Laser Focus World of Jan. 1989.
Honeywell Inc.
Pianalto Bernard
Shudy Jr. John G.
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