Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-04-26
2005-04-26
Hail, III, Joseph J. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S041000, C451S042000, C451S057000, C451S060000, C451S177000, C451S179000, C451S289000, C451S209000, C451S210000, C451S397000, C451S402000, C451S403000
Reexamination Certificate
active
06884154
ABSTRACT:
In a process for polishing the chamfered peripheral part of a wafer using a polishing cloth while supplying a polishing slurry in order to improve productivity of the process by reducing a polishing time, at least two steps of polishing processes are performed in sequence. The process comprises a first polishing process to polish a particular part, e.g. the part corresponding to the {110} plane of a peripheral part of the wafer and a second polishing process in which the whole part of a peripheral part of the wafer is polished for finishing by means of varying a hardness of the polishing clothes and/or a particle size of abrasives in the slurry such as the hardness of the polishing cloth in the second polishing process being softer than that of in the first polishing process and a particle size of abrasives in the slurry in the second polishing process being finer than that of in the first polishing process.
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patent: 5727990 (1998-03-01), Hasegawa et al.
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patent: 6306016 (2001-10-01), Steere, Jr. et al.
Miura Nakaji
Mizushima Kazutoshi
Sekine Yasuhiro
Suzuki Makoto
Tomii Kazuya
Hail III Joseph J.
McDonald Shantese
Shin-Etsu Handotai & Co., Ltd.
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