Method for apodizing a planar waveguide grating

Details Method for apodizing a planar waveguide grating Method for apodizing a planar waveguide grating

2005-01-11

2005-01-11

Lee, John D. (Department: 2874)

Optical waveguides

Directional optical modulation within an optical waveguide

Electro-optic

C385S037000, C430S290000

Reexamination Certificate

active

06842544

ABSTRACT:
A method for making an apodized Bragg grating in a photosensitive, planar, linear waveguide. A photosensitive, planar, linear waveguide is provided on a surface of a substrate. A patterned phase mask is placed between the waveguide and a laser beam. The waveguide is exposed through the phase mask to the laser beam wherein either the laser beam is moving at a substantially constant velocity with respect to the substrate and phase mask, or the substrate and phase mask are moving at a substantially constant velocity with respect to the laser beam. The beam has a smoothly varying intensity profile, and the exposure is conducted at an angle of more than 0° and less than 90° to the longitudinal axis of the waveguide under conditions sufficient to induce a modulation in the index of refraction of the waveguide and impart an apodized Bragg grating in the waveguide corresponding to the phase mask pattern.

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