Static molds – Container-type molding device – Of named component
Reexamination Certificate
2006-12-12
2006-12-12
Heckenberg, Donald (Department: 1722)
Static molds
Container-type molding device
Of named component
C148S516000, C148S675000, C205S070000
Reexamination Certificate
active
07147201
ABSTRACT:
A method for annealing a structure formed by electrodeposition is provided, the method comprising providing the electrodeposition structure, the electrodeposition structure comprising an electroformed mold, the electroformed mold having a nominal thickness between and including 0.5 mm to 8.0 mm and having a melting temperature; heating the electrodeposition structure to a temperature between ambient temperature and the melting temperature of the electrodeposition structure; isostatically pressurizing the electrodeposition structure to a pressure above ambient pressure; cooling the electrodeposition structure to ambient temperature; and depressurizing the electrodeposition structure to ambient pressure.
REFERENCES:
patent: 4023966 (1977-05-01), Loersch et al.
patent: 4108740 (1978-08-01), Wearmouth
patent: 4389177 (1983-06-01), Colby
patent: 4522659 (1985-06-01), Prusak
patent: 4562026 (1985-12-01), Mosher
patent: 4564501 (1986-01-01), Goldstein
patent: 4610620 (1986-09-01), Gray
patent: 4623503 (1986-11-01), Anestis et al.
patent: 4755333 (1988-07-01), Gray
patent: 4780345 (1988-10-01), Gray
patent: 4890995 (1990-01-01), Gray
patent: 4923657 (1990-05-01), Gembinski et al.
patent: 4925151 (1990-05-01), Gray
patent: 5032076 (1991-07-01), Jackson, Jr.
patent: 5037678 (1991-08-01), Kinkelaar
patent: 5238622 (1993-08-01), Grimmer
patent: 5290499 (1994-03-01), Tischler
patent: 5445510 (1995-08-01), Jackson, Jr.
patent: 5470651 (1995-11-01), Milinkovic et al.
patent: 5824738 (1998-10-01), Humphrey et al.
patent: 5998030 (1999-12-01), Grimmer
patent: 6692680 (2004-02-01), Lee et al.
patent: 2004/0128016 (2004-07-01), Stewart
Combs Richard
Grimmer Robert
Risca Alex
Collins & Aikman
Grossman Tucker Perreault & Pfleger PLLC
Heckenberg Donald
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