X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-07-24
2007-07-24
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S083000
Reexamination Certificate
active
10958249
ABSTRACT:
A method and apparatus for analyzing a membrane structure by fitting simulated operation data to measured data obtained by X-ray reflectivity measurement to analyze the membrane structure. The analysis result obtained by the fitting can be prevented from falling into a local solution, so as to obtain an analysis result of the membrane structure with high accuracy. The method for analyzing a membrane structure for analyzing a structure of a membrane specimen having a single layer membrane or a multi-layer membrane by an X-ray reflectivity measurement, includes a step of simultaneously analyzing plural pieces of measured data obtained by measuring the membrane specimen under plural sets of measuring conditions different from each other in at least one of a resolution and a dynamic range.
REFERENCES:
patent: 6025596 (2000-02-01), Shirai et al.
patent: 6907107 (2005-06-01), Wallis et al.
patent: 2002/0150208 (2002-10-01), Yokhin et al.
patent: 9-105726 (1997-04-01), None
Ito Yoshiyasu
Omote Kazuhiko
Glick Edward J.
Kiknazde Irakli
Rigaku Corporation
LandOfFree
Method for analyzing membrane structure and apparatus therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for analyzing membrane structure and apparatus therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for analyzing membrane structure and apparatus therefor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3732273