Optics: measuring and testing – With sample preparation
Patent
1992-09-10
1994-11-01
Willis, Davis L.
Optics: measuring and testing
With sample preparation
356311, G01N 100
Patent
active
053611284
ABSTRACT:
The present invention is a method for analyzing irregular-shaped chunked silicon for low-level contaminates. The method comprises selecting a zonable-chunk of silicon and float-zoning the chunk of silicon to effect a distribution of surface contaminates into the bulk of a monocrystal of silicon. The float-zoned monocrystalline silicon is then processed into a wafer suitable for analysis for low-level contaminates.
REFERENCES:
patent: 4912528 (1990-03-01), Hwang et al.
Kramer; Float-Zoning of Semiconductor Silicon: A Perspective, Solid State Technology, Jan. 1983, pp. 137-142.
Tajima; Jpn. Ann. Rev. Electron Comput. & Telecommun. Semicond. Technol. pp. 1-12 (1982); Quantitative Impurity Analysis in Si by The Photoluminescence Technique.
Bourbina Michael
Hwang Lydia L.
Luna Joaquin E.
Wheelock Scott A.
Boley William F.
Hemlock Semiconductor Corporation
Keesee, II LaCharles P.
Willis Davis L.
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