Method for analyzing impurities in carbon dioxide

Optics: measuring and testing – For light transmission or absorption – Of fluent material

Reexamination Certificate

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C356S336000

Reexamination Certificate

active

07064834

ABSTRACT:
This invention relates to methods and systems for detecting contaminants that can precipitate and deposit on a workpiece during a carbon dioxide application, especially contaminants that are already present and dissolved in the fresh carbon dioxide fed to the application. One aspect of this invention includes a method of detecting contaminants dissolved in a carbon dioxide stream, including the steps of sampling at least a portion of the carbon dioxide stream to form a carbon dioxide sample; modifying at least one physical condition of the carbon dioxide sample to form an aerosol that includes gaseous carbon dioxide and at least one suspended contaminant; and detecting the number of particles of suspended contaminant in at least a portion of the carbon dioxide sample with at least one particle counter. A system for continuously detecting contaminants dissolved in a carbon dioxide stream is also described.

REFERENCES:
patent: 3787122 (1974-01-01), Lepper, Jr.
patent: 3854321 (1974-12-01), Dahneke
patent: 4806171 (1989-02-01), Whitlock et al.
patent: 4868398 (1989-09-01), Mulcey et al.
patent: 4894529 (1990-01-01), Borden et al.
patent: 5027642 (1991-07-01), Wen et al.
patent: 5065794 (1991-11-01), Cheung
patent: 5254719 (1993-10-01), Holzhauer et al.
patent: 5265031 (1993-11-01), Malczewski
patent: 5278626 (1994-01-01), Poole et al.
patent: 5298967 (1994-03-01), Wells
patent: 5369033 (1994-11-01), Di Milia et al.
patent: 5665902 (1997-09-01), Wang et al.
patent: 5777726 (1998-07-01), Krone-Schmidt
patent: 5865901 (1999-02-01), Yin et al.
patent: 5968371 (1999-10-01), Verdegan et al.
patent: 5992216 (1999-11-01), Wang et al.
patent: 5996420 (1999-12-01), Lee
patent: 6016686 (2000-01-01), Thundat
patent: 6122954 (2000-09-01), Bowers
patent: 6244120 (2001-06-01), Maeda
patent: 6276169 (2001-08-01), Bowers et al.
patent: 6284022 (2001-09-01), Sachweh et al.
patent: 6289715 (2001-09-01), Gilbert et al.
patent: 6639671 (2003-10-01), Liu
patent: 6676768 (2004-01-01), Fillipi et al.
patent: 6786075 (2004-09-01), Radke et al.
Maximilian A. Biberger, et al.,Photoresist and Photoresist Residue Removal with Supercritical CO2—A Novel Approach to Cleaning Wafers, Semiconductor Fabtech 239-243 (12th ed. 2000).
Thomas Kosic & Jeff L. Palser,Carbon Dioxide Meets the Challenge of Precision Cleaning, Solid State Tech. 1:7 (May 1998).
Kenneth E. Laintz, et al.,Solubility in Supercritical Fluid Cleaningin Supercritical Fluid Cleaning Fundamentals, Technology and Applications 22-37 (John McHardy & Samuel P. Sawan eds., 1998).
Guo-Tang Liu & Kunio Nagahama,Application of Rapid Expansion of Supercritical Solutions in the Crystallization Separation, 35 Ing. Eng. Chem. Res. 4626-34 (1996).
M.J. Sepaniak, et al.,Microcantilever Transducers: A New Approach in Sensor Technology, 74 Analytical Chemistry 568A (2002).
Richard R. Zito,CO2Snow Cleaning of Optics: Curing the Contamination Problem, Proc. of SPIE—The Int'l Soc'y for Optical Eng'g 4096 (2000).

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