X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-05-02
2006-05-02
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S090000
Reexamination Certificate
active
07039161
ABSTRACT:
A method and apparatus for analyzing a film structure analyze particle or pore size distribution with high accuracy and evaluate a shape of a surface or interface even in the case where the absolute amount of particles or pores in the thin film is small. The method includes fitting a simulated X-ray scattering curve obtained by simulation calculation to a measured X-ray scattering intensity curve obtained by emitting an X-ray onto a surface of a film specimen having a single layer or multi-layer structure at an angle in the vicinity of the critical angle to the surface, by varying at least one parameter characterizing a physical property of the specimen, and obtaining optimum values of parameters providing the minimum difference between the measured X-ray scattering curve and the simulated X-ray scattering curve, so as to determine the structure of the film specimen, in which plural combinations of incident angle and outgoing angle relative to the surface of the film specimen are set so that there is no correlation between the incident angle and the outgoing angle, and the simulated X-ray scattering curve is fitted to the X-ray scattering curve that is obtained by measuring X-ray intensity for the respective combinations of incident angle and outgoing angle.
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Ito Yoshiyasu
Omote Kazuhiko
Glick Edward J.
Kiknadze Irakli
Rigaku Corporation
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