Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2008-04-01
2008-04-01
Le, Brian (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C356S237300
Reexamination Certificate
active
07352890
ABSTRACT:
A system for analyzing defects in electronic circuit patterns, including: comparing position information of structural defects with position information of electrical faults and extracting corroborated defects having common position information between the structural defects and electrical faults; classifying images of extracted corroborated defects into critical defect images and non-critical defect images based on a pre-stored classification rule which defines critical and non-critical defects by referring to images of defects, position information of defects, and results of performing an electronic test; modifying the pre-stored classification rule by correcting classification of classified defect images displayed on the screen; and repeating the operations for each subsequent object, wherein for each present object under inspection, using a modified pre-stored classification rule with respect to a previous object, as the pre-stored classification rule for the operations with respect to the present object.
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Hamamura Yuichi
Ishimaru Ichirou
Isogai Seiji
Ozawa Yasuhiko
Shimoda Atsushi
Antonelli, Terry Stout & Kraus, LLP.
Hitachi , Ltd.
Le Brian
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