Method for analying an impurity on a semiconductor substrate

Details Method for analying an impurity on a semiconductor substrate Method for analying an impurity on a semiconductor substrate

1994-12-07

1997-05-27

Housel, James C.

Chemistry: analytical and immunological testing

Including sample preparation

Liberation or purification of sample or separation of...

436174, 436 5, G01N 3100

Patent

active

056331720

ABSTRACT:
A method is provided for analyzing an impurity on a semiconductor substrate. In this method, those to-be-measured areas on a surface of a semiconductor substrate are exposed with an ultraviolet radiation to provide corresponding oxide films. By doing so, an impurity is trapped in the oxide film at each area of the semiconductor substrate. The surface of the semiconductor substrate is cleaned with an acid solution to remove an impurity on other than the areas on the surface of the semiconductor substrate. The surface of the semiconductor substrate is exposed with a hydrofluoric acid vapor to dissolve the oxide films into very fine droplets containing an impurity. These droplets are moved on the surface of the semiconductor substrate to collect these droplets into a drop on the surface of the semiconductor substrate. The impurity in the drop is measured by a known chemical spectrometer.

REFERENCES:
patent: 3660250 (1972-05-01), Duffy et al.
patent: 4168212 (1979-09-01), Faktor et al.
patent: 4180439 (1979-12-01), Deines et al.
patent: 4634497 (1987-01-01), Shimazaki
patent: 4990459 (1991-02-01), Maeda et al.
patent: 5055413 (1991-10-01), Kageyama et al.
patent: 5252827 (1993-10-01), Koga et al.
patent: 5385629 (1995-01-01), Lamberton et al.
patent: 5397475 (1995-03-01), Millar et al.
Patent Abstracts of Japan, Kokai No. 4-225526, vol. 16, No. 574, 1992.
Patent Abstracts of Japan, Kokai No. 2-229428, vol. 14, No. 541, 1990.
Patent Abstracts of Japan, Kokai No. 3-239343, vol. 16, No. 23, 1992.
Patent Abstracts of Japan, Kokai No. 3-004166, vol. 15, No. 115,1991.
Patent Abstracts of Japan, Kokai No. 5-343494, vol. 18, No. 171, 1994.

Affiliated with

Also associated with

Rating

Method for analying an impurity on a semiconductor substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for analying an impurity on a semiconductor substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for analying an impurity on a semiconductor substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2328569