Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1994-07-01
1995-11-21
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
250548, G01B 1100
Patent
active
054692636
ABSTRACT:
A method for alignment in photolithographic processes includes providing a target (31) comprising features having a characteristic spatial period (P). An optical image of the target is captured, and components (33) of the image lacking the characteristic spatial period (P) are filtered out. The filtered image is integrated in the direction of the characteristic period (P) thereby creating an alignment signal (40). The alignment signal (40) is a symmetric signal which correlates to the symmetric target (31). A linear centroid (41) of the alignment signal is located, and corresponds to the precise linear center of the target (31). Consequently, the linear location of an object (10) upon which the target (31) is printed, can be accurately located. The process is performed in two perpendicular dimensions (x,y) so that the object (10) can be precisely located and positioned in two dimensions (x,y).
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Cerrina Franco
Chen Gong
Waldo, III Whitson G.
Barbee Joe E.
Evans F. L.
Kim Robert
Motorola Inc.
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