Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1997-08-01
1999-05-18
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 5, 430319, G03F9/00
Patent
active
059050071
ABSTRACT:
An integrated circuit, or microelectromechanical structure is defined onto a contour surface by utilizing a flexible mask upon which photolithographic patterns are first defined using conventional planar photolithographic techniques. The contour surface is provided with a thin film uniformly distributed on the surface and then the flexible mask is aligned with the contour substrate. Alignments are made through multiple stages of yaw alignment, translation alignment and rotational alignment. Once the mask is aligned with contour substrate it is then subjected while rotating to developing field, such as uniform illumination of ultraviolet light shining on the side of the contour substrate as it is rotated in the illumination field. The developed photoresist layer disposed on the surface of the contour substrate is thus developed and the underlying film etched according to the patterned mask in a manner similar to a conventional planar photolithography. Multiple layers are thus disposed masked and etched to result in complex multilayered integrated circuit and/or microelectromechanical devices disposed on the contour surface of a macromechanical component or structure.
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"A Concentric Build-Up Process to Fabricate Pratical Wobble Motors" by H. Ogura, et al. IEEE (Jan. 1994), pp. 114-118. Microelectromechanical System (MEMS) Sensor After Active Laser Trimming" Revise, Inc. (Sep. 8, 1996).
"Frabrication of Submicrometer Features on Curved Substrates by Microcontact Printing" by Jackman et al. Science vol. 269 (Aug. 4, 1995), pp. 664-666.
"Features of Gold Having Micrometer to Centimeter Dimensions Can Be Formed Through a Combination of Stamping With an Elastomeric. . . " by Amit Kumar et al., Appl. Phys. Lett. 63(14) (Oct. 4, 1993), pp. 2002-2004.
"Fabrication of Micro-Structures Using Non-Planar Lithography (NPL)" by Stephen C. Jacobsen et al. MEMS (1993), pp. 45-50.
Ho Chih-Ming
Li Wen J.
Dawes Daniel L.
The Regents of the University of California
Young Christopher G.
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