Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2008-04-01
2008-04-01
Kim, Paul (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S842000, C029S846000, C029S854000, C174S255000, C174S256000, C174S261000, C174S262000, C257S531000, C257S534000, C257S539000, C361S780000, C361S792000, C361S795000, C361S803000
Reexamination Certificate
active
07350292
ABSTRACT:
A method for affecting an impedance of a portion of an electrical circuit loop in an electrical circuit apparatus includes providing an electrical circuit apparatus having at least a portion of an electrical circuit loop including at least one of at least one trace and at least one via, and providing a layer of magnetic material disposed adjacent at least one of the trace and the via. The trace and the via are operatively connected together to provide electrical communication. Dielectric material is disposed in an operative relationship adjacent at least one of the trace and the via. The layer of magnetic material is disposed in operative relationship near at least one of the trace and the via to affect the impedance of at least one of the trace, the via and the portion of the circuit loop formed by the trace and the via.
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Shamik Das et al., “Three-Dimensional Integrated Circuits: Performance, Design Methodology, and CAD Tools,” Feb. 2003, six (6) pages.
Michael J. Tsuk, “Apparatuses, Systems and/or Methods to Affect Impedance,” U.S. Appl. No. 60/554,796, Filed on Mar. 19, 2004.
Hewlett--Packard Development Company, L.P.
Kim Paul
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