Method for adjusting a substrate in an appliance for...

Details Method for adjusting a substrate in an appliance for... Method for adjusting a substrate in an appliance for...

2007-07-24

2007-07-24

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With light detector

Reexamination Certificate

active

10717413

ABSTRACT:
The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections are in each case used differently for adjusting the respective exposure of the exposure areas.

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