Method for adjusting a semiconductor disk relative to a radiatio

Details Method for adjusting a semiconductor disk relative to a radiatio Method for adjusting a semiconductor disk relative to a radiatio

1978-04-20

1979-11-27

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250272, 250491, A61K 2702, G01M 2100

Patent

active

041762819

ABSTRACT:
In the illustrative disclosure, alignment of x-ray masks, with elements in the submicron range for x-ray lithographic replication, is carried out with the use of through-bores in the set of masks and in the substrates. A single point x-ray source may be used to produce widely offset parallel beams defining the bore alignment axes, or the bores may be formed with oblique axes converging at a point, so as to be usable with diverging x-ray beams from a point x-ray source.

REFERENCES:
patent: 3742229 (1973-06-01), Smith et al.
patent: 3743842 (1973-07-01), Smith et al.
patent: 3745358 (1973-07-01), Fritz et al.
patent: 4085329 (1978-04-01), McCoy et al.
"X-Ray Lithography---" by Spears & Smith, Solid State Technology, Jul. 1972, pp. 21-26.
"Mask Alignment---Lithography" by McCoy et al., Solid State Technology, Sep. 1976, pp. 59-64.

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