Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1994-03-18
1995-07-11
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427577, 427249, B05D 306, C23C 1626
Patent
active
054319633
ABSTRACT:
The electrical field at the surface of an electrode is graded by depositing a semiconductive coating thereon. An electrode substrate is powered at a preselected temperature and power. A mixture of gases is then passed through an electrical discharge to ionize at least a portion thereof to form the semiconductive coating on the surface of the electrode. A diamondlike carbon (DLC) film is deposited by plasma enhanced chemical vapor deposition onto a substrate. A substrate is maintained at a preselected DLC forming temperature and is negatively biased at a first preselected voltage. A first gaseous mixture of hydrocarbons and argon is then passed through an electrical discharge to at least partially ionize the hydrocarbons to form DLC film on the substrate. The substrate is then negatively biased at a second preselected voltage lower than the first preselected voltage. A second gaseous mixture of hydrocarbons and argon or hydrogen is then passed through the electrical discharge to at least partially ionize the hydrocarbons to form additional DLC film on the substrate.
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DeVre Michael W.
Rzad Stefan J.
Beck Shrive
Chen Bret
General Electric Company
Pittman William H.
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