Method for addressing wavefront aberrations in an optical system

Plastic and nonmetallic article shaping or treating: processes – Optical article shaping or treating – Utilizing plasma – electric – electromagnetic – particulate – or...

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264 17, 264 27, B29D 1100

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active

059085860

ABSTRACT:
Method for correcting aberrations of an optical system and solving the problem of tolerance buildup. The method posits a desired specification limit for each of at least one optical characteristic of an optical element, and requires embossing at least a portion of a surface of the optical element for bringing the or each optical characteristic within its corresponding specification limit.

REFERENCES:
patent: 3922327 (1975-11-01), Howden
patent: 4902100 (1990-02-01), Reynolds et al.

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