Method for a multiple exposure beams lithography tool

Details Method for a multiple exposure beams lithography tool Method for a multiple exposure beams lithography tool

2011-04-05

2011-04-05

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

Reexamination Certificate

active

07919218

ABSTRACT:
An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by simultaneously using a plurality of exposure beams. In an example embodiment it is determined if any of the beams have an actual position relative to a reference beam which differs from its intended position. An adjustment of the exposure dose for a wrongly positioned beam is performed if said beam is printed at en edge of a feature. Other aspects of the present invention are reflected in the detailed description, figures and claims.

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patent: WO-0072090 (2000-11-01), None

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