Method, device and system for evaluating a lens for an...

Optics: measuring and testing – Inspection of flaws or impurities – Transparent or translucent material

Reexamination Certificate

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C356S239100, C356S237100, C250S559400, C250S559490

Reexamination Certificate

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07639353

ABSTRACT:
The invention relates to a system, method and device for evaluating imperfections in a lens for a display for an electronic device. For the device, it comprises: a substrate; and a pattern imposed on the substrate. For the pattern, when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens. For the system, it comprises: an evaluation table for the lens, the table having a mounting area; and a substrate for mounting on the mounting area, the substrate having a pattern imposed thereon wherein when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens.

REFERENCES:
patent: 4876121 (1989-10-01), Cohen
patent: 5812260 (1998-09-01), Louisnathan
patent: 5847822 (1998-12-01), Sugiura et al.
patent: 6195164 (2001-02-01), Thompson et al.
patent: 7166856 (2007-01-01), Cho et al.
patent: 2002/0070000 (2002-06-01), Weyer et al.
patent: 2006/0017676 (2006-01-01), Bowers et al.
patent: 2006/0110580 (2006-05-01), Aylward et al.
patent: 2007/0046321 (2007-03-01), Kang et al.
patent: 1 061 329 (2000-12-01), None

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