Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2011-06-28
2011-06-28
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S070000
Reexamination Certificate
active
07969554
ABSTRACT:
A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident beams are determined using a near linear program and responsive to an allowed range of variation. Computer program, apparatus and system are detailed and variations are described.
REFERENCES:
patent: 5091744 (1992-02-01), Omata
patent: 5680588 (1997-10-01), Gortych et al.
patent: 6563566 (2003-05-01), Rosenbluth et al.
patent: 7050155 (2006-05-01), Case et al.
patent: 7057709 (2006-06-01), Rosenbluth
patent: 2003/0206281 (2003-11-01), Jain
patent: 2005/0122501 (2005-06-01), Rosenbluth
patent: 2005/0202350 (2005-09-01), Colburn et al.
A.E. Rosenbluth and N. Seong, “Global Optimization of the Illumination Distribution to Maximize Integrated Process Window” , SPIE v.6154 (2006), 12 pages.
A.K. Wong et al., “Level-specific lithography optimization for 1-GB DRAM,” IEEE Transactions on Semiconductor Manufacturing 13, No. 1 (Feb. 2000), pp. 76-87.
M. Burkhardt et al., “Illuminator design for the printing of regular contact patterns,” Microelectronic Engineering, v.41-42 (1998), pp. 91-95.
A.E. Rosenbluth, et al., “Optimum Mask and Source Patterns to Print a Given Shape,” JM3 1, No. 1 (2002), pp. 13-30.
T.-S. Gau et al., “The Customized Illumination Aperture Filter for Low k1 Photolithography Process”, in SPIE v.4000—Optical Microlithography XIII, ed. C.P. Progler (Santa Clara, CA: SPIE, 2000), pp. 271-282.
Melville David O. S.
Rosenbluth Alan E.
Tian Kehan
Harrington & Smith
International Business Machines - Corporation
Nguyen Hung Henry
Whitesell-Gordon Steven H
LandOfFree
Method, computer program, apparatus and system providing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method, computer program, apparatus and system providing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method, computer program, apparatus and system providing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2629497