Method, computer program, apparatus and system providing...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C355S070000

Reexamination Certificate

active

07969554

ABSTRACT:
A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident beams are determined using a near linear program and responsive to an allowed range of variation. Computer program, apparatus and system are detailed and variations are described.

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A.K. Wong et al., “Level-specific lithography optimization for 1-GB DRAM,” IEEE Transactions on Semiconductor Manufacturing 13, No. 1 (Feb. 2000), pp. 76-87.
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A.E. Rosenbluth, et al., “Optimum Mask and Source Patterns to Print a Given Shape,” JM3 1, No. 1 (2002), pp. 13-30.
T.-S. Gau et al., “The Customized Illumination Aperture Filter for Low k1 Photolithography Process”, in SPIE v.4000—Optical Microlithography XIII, ed. C.P. Progler (Santa Clara, CA: SPIE, 2000), pp. 271-282.

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