Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-06-26
1999-11-23
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, G03F 900
Patent
active
059897538
ABSTRACT:
In order to make it possible to suppress projection errors in the portions of patterns which are connected together, in a method of pattern projection which includes a process of making a pattern of a beam of charged particle, in which a beam of charged particles is irradiated upon a small region upon a mask and the beam of charged particles is caused to change by the influence of pattern which is provided on the selected small regions, a process of projection in which the patterns of the beam of charged particles are projected upon a certain portion of a projection reception region which is defined upon a sensitive plate, a process of scanning in which the small region and the certain portion are selected in sequence, the patterns of the selected small regions are projected upon the selected certain portions and connected in sequence, a process of irradiation amount reduction is performed, during the scanning process, the amount of irradiation by the beam of charged particles of the peripheral portion of the selected of small regions is reduced in correspondence to the distance from the center of the selected small regions. From a pair of projection reception regions upon the sensitive plate which mutually neighbor one another, the regions for which the amount of irradiation by the beam of charged particles is reduced are mutually superimposed.
REFERENCES:
patent: 5260151 (1993-11-01), Berger et al.
patent: 5376505 (1994-12-01), Berger et al.
patent: 5523580 (1996-06-01), Davis
David A. Markle, Deep UV Lithography: Problems and Potential, SPIE vol. 774 Lasers in Microlithography Mar./(1987) pp. 108-114.
James P. Rominger, Seamless Stitching for Large Area Integrated Circuit Manufacturing, SPIE vol. 992, Optical/Laser Microlithography May/(1988).
Nikon Corporation
Rosasco S.
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