Method and test structure for estimating focus settings in a...

Details Method and test structure for estimating focus settings in a... Method and test structure for estimating focus settings in a...

2007-05-30

2011-10-18

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

Lens or reflective image former testing

C356S625000, C356S636000, C430S022000, C430S030000, C355S077000, C250S559190, C250S559240

Reexamination Certificate

active

08040497

ABSTRACT:
By encoding process-related non-uniformities, such as different height levels, which may be caused by CMP or other processes during the fabrication of complex device levels, such as metallization structures, respective focus parameter settings may be efficiently evaluated on the basis of well-established CD measurement techniques.

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Translation of Official Communication from German Patent Office dated Jul. 19, 2007.

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