Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2005-02-11
2009-02-24
Young, Christopher G (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S330000
Reexamination Certificate
active
07494752
ABSTRACT:
A method and system for utilizing a simplified resist process model to perform optical and process corrections. More specifically, the present invention provides a fast and easy post exposure bake (PEB) effects calculation which can be used in connection with OPC. The model can be used to increase OPC modeling accuracy, by taking PEB effects into consideration, without incurring a large overhead increase due to PEB calculation cost. The method includes providing an image, calculating initial acid concentration and adding acid concentration contours to the image, calculating deprotection concentration and adding deprotection concentration contours to the image, determining latent image contour without diffusion, moving the latent image contour in a direction of lower deprotection concentration to provide the final latent image, performing OPC on the chemically amplified resist using edge movement based on the final latent image, and repeating the process to obtain convergence.
REFERENCES:
Croffie, E., “Simulation Tools for Optical Resist Models (STORM)”, Ph.D. Thesis, Memorandum No. UCB/ERL M01/29, University of California, Berkely, Aug. 2001, pp. 26-35.
LSI Corporation
Trexler Bushnell Giangiorgi & Blackstone Ltd.
Young Christopher G
LandOfFree
Method and systems for utilizing simplified resist process... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and systems for utilizing simplified resist process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and systems for utilizing simplified resist process... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4089900