Photocopying – Projection printing and copying cameras – Focus or magnification control
Reexamination Certificate
2003-10-03
2008-08-19
Kim, Peter B (Department: 2851)
Photocopying
Projection printing and copying cameras
Focus or magnification control
C359S290000
Reexamination Certificate
active
07414701
ABSTRACT:
A method and system for correcting optical aberrations in a maskless lithography system. Adjusters move individual spatial light modulators (SLMs) in an SLM array so that the surface of the SLM array deviates from a flat plane. The deviation compensates for aberrations in the lithography system, such as total focus deviation. In an embodiment, an individual SLM can be tilted, bent, and/or have its elevation changed. Multiple SLMs in the SLM array can move in different ways depending on the compensation to be made. The adjusters can be either actively or passively controlled. The method may be performed only during initial setup of the maskless lithography system, periodically as needed for maintenance of the lithography system, or prior to each exposure in the lithography system.
REFERENCES:
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4666291 (1987-05-01), Taniguchi et al.
patent: 4737824 (1988-04-01), Sakai et al.
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5883703 (1999-03-01), Knirck et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6229871 (2001-05-01), Tichenor
patent: 6356340 (2002-03-01), Spence
patent: 6379867 (2002-04-01), Mei et al.
patent: 6416908 (2002-07-01), Klosner et al.
patent: 6433917 (2002-08-01), Foong et al.
patent: 6509955 (2003-01-01), Mei et al.
patent: 6617082 (2003-09-01), Hutchinson
patent: 6618185 (2003-09-01), Sandstrom
patent: 6687041 (2004-02-01), Sandstrom
patent: 6696008 (2004-02-01), Brandinger
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 2003/0210383 (2003-11-01), Jain et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: 2005/0046921 (2005-03-01), Govil et al.
patent: 2005/0068510 (2005-03-01), Bleeker et al.
patent: 1 139 176 (2001-10-01), None
patent: 1 271 247 (2003-01-01), None
patent: 1 280 007 (2003-01-01), None
patent: 2001-297982 (2001-10-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 02/42825 (2002-05-01), None
European Search Report for European Appln. 03255906.4, 4 pages, dated Aug. 30, 2004.
European Search Report for European Appln. 04255638.1, 7 pages, dated Mar. 16, 2005.
Office Action for Japanese Patent Application No. 2004-273338 mailed Jan. 8, 2008, 3 pgs.
Notice of Allowance mailed Jan. 30, 2008 for U.S. Appl. No. 10/946,333, 4 pgs.
ASML Holding N.V.
Kim Peter B
Sterne Kessler Goldstein & Fox P.L.L.C.
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