Method and system of laser processing

Details Method and system of laser processing Method and system of laser processing

1998-12-10

2000-11-21

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Electromagnetic or particulate radiation utilized

427554, 427582, 216 65, 216 94, 216 87, 21912175, 21912185, B05D 306, B23K 2606

Patent

active

061499889

ABSTRACT:
A method for treating an object with a laser including emitting a laser beam from a laser; expanding the laser beam in a first direction; removing a portion of the laser beam though a mask, the portion including at least edges of the expanded laser beam extending in the first direction; and condensing the laser beam in a second direction orthogonal to the first direction in order to form a line-shaped laser beam on an object.

REFERENCES:
patent: Re33947 (1992-06-01), Shinohara
patent: 3848104 (1974-11-01), Locke
patent: 3877777 (1975-04-01), Glenn, Jr.
patent: 4059461 (1977-11-01), Fan et al.
patent: 4154530 (1979-05-01), Connolly, Jr. et al.
patent: 4181563 (1980-01-01), Miyaka et al.
patent: 4233626 (1980-11-01), Bell
patent: 4270132 (1981-05-01), Bell
patent: 4292092 (1981-09-01), Hanak
patent: 4309225 (1982-01-01), Fan et al.
patent: 4314256 (1982-02-01), Petrov et al.
patent: 4341569 (1982-07-01), Yaron et al.
patent: 4358659 (1982-11-01), Sponheimer
patent: 4370175 (1983-01-01), Levatter
patent: 4413020 (1983-11-01), McKee et al.
patent: 4444801 (1984-04-01), Hongo et al.
patent: 4468551 (1984-08-01), Neiheisel
patent: 4473433 (1984-09-01), Bosch et al.
patent: 4543464 (1985-09-01), Takeuchi
patent: 4568409 (1986-02-01), Caplan
patent: 4680855 (1987-07-01), Yamazaki et al.
patent: 4713518 (1987-12-01), Yamazaki et al.
patent: 4727234 (1988-02-01), Oprysko et al.
patent: 4753855 (1988-06-01), Haluska et al.
patent: 4753856 (1988-06-01), Haluska et al.
patent: 4784963 (1988-11-01), Krimmel et al.
patent: 4786358 (1988-11-01), Yamazaki et al.
patent: 4861964 (1989-08-01), Sinohara
patent: 4874920 (1989-10-01), Yamazaki et al.
patent: 4915981 (1990-04-01), Traskos et al.
patent: 4937129 (1990-06-01), Yamzaki
patent: 4970368 (1990-11-01), Yamazaki et al.
patent: 4970369 (1990-11-01), Yamazaki et al.
patent: 5084300 (1992-01-01), Zander et al.
patent: 5112645 (1992-05-01), Sekine et al.
patent: 5306651 (1994-04-01), Masumo et al.
patent: 5320984 (1994-06-01), Zhang et al.
patent: 5432122 (1995-07-01), Chae
patent: 5453858 (1995-09-01), Yamazaki
patent: 5656826 (1997-08-01), Misawa et al.
patent: 5708252 (1998-01-01), Shinohara et al.
patent: 5897799 (1999-04-01), Yamzaki et al.
patent: 6002101 (1999-12-01), Yamazaki et al.
Palmer,C. Harvey, "Optics:Experiments and Demonstrations ",The John Hopkins Press, 1962, pp. 10-11.
"Optical System for Laser Machining of Narrow Slots", by Grimm, IBM Technical Disclosure Bulletin, vol. 14, No. 9, pp. 2641-2642, Feb. 1972.
Gladstone et al., "Liquid Crystal Display Device Configuration", IBM Technical Disclosure Bulletin, vol. 15, No. 2, Jul. 1972, pp. 437-438.
Bahadur, "Molecular Crystals and Liquid Crystals", vol. 109, No. 1, New York, no month (1984), pp. 24-26.
T. McGrath, "Applications of Excimer Lasers in Microelectronics", Solid State Technology, pp. 165-169, Dec., 1983.
K. Sera et al., "High-Performance TFT's Fabricated by XeCI Excimer Laser Annealing of Hydrogenated Amorphous-Silicon Film", IEEE Transactions on Electron Devices, vol. 36, No. 12, pp. 2868-2872, Dec. 1989.
T. Sameshima et al., "XeCI Excimer Laser Annealing Used to Fabricate Poly-Si TFT's", Japanese Journal of Applied Physics, vol. 28, No. 10, Oct. 1989, pp. 1789-1793.
A. Morikawa et al., "Special Article: Present Situation of Laser Processing Technique Application of Surface Modification by Co.sub.2 Laser", including English translation, Sep. 1990.
S. Kaneko, "VI. Excimer Laser Annealed Poly-Crystalline Silicon TFT", T. IEE Japan, vol. 110-A, No. 10, '90, pp. 679-683, including English translation. no month.
Semiconductor World "Excimer Laser Annealing Apparatus", pp. 196-197 (translation--pp. 1-4) Semiconductor World "Excimer Laser Annealing Apparatus" Oct. 1, 1992, pp. 196-197 (translation--pp. 1-4).

Affiliated with

Also associated with

Rating

Method and system of laser processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system of laser processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system of laser processing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1254576