Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2007-02-16
2009-12-08
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
C356S237400, C250S492200, C250S372000
Reexamination Certificate
active
07630068
ABSTRACT:
Defect detection is performed with two settings, that is, setting of a focus position where a signal intensity obtained from a dot pattern is maximum and setting of a focus position where a signal intensity obtained from a hole pattern is maximum. In addition, defect detection is performed at a predetermined focus position previously set and for the detected defect, the focus position is changed at that position to find a focus position where the signal intensity is maximum. If the focus position is away from a signal light-receiving system, the defect is determined as dot-shaped. If the focus position is close to the signal light-receiving system, the defect is determined as hole-shaped. If the focus position is intermediate of them, the defect is determined as an elongated-shaped.
REFERENCES:
patent: 4749840 (1988-06-01), Piwczyk
patent: 5131023 (1992-07-01), Yasugaki et al.
patent: 5151609 (1992-09-01), Nakagawa et al.
patent: 5177774 (1993-01-01), Suckewer et al.
patent: 5331456 (1994-07-01), Horikawa
patent: 5619382 (1997-04-01), Kato et al.
patent: 5808312 (1998-09-01), Fukuda
patent: 6042995 (2000-03-01), White
patent: 6522717 (2003-02-01), Murakami et al.
patent: 6555828 (2003-04-01), Bokor et al.
patent: 6617603 (2003-09-01), Ishiguro et al.
patent: 6738135 (2004-05-01), Underwood et al.
patent: 6954266 (2005-10-01), Tomie
patent: 7005649 (2006-02-01), Tezuka et al.
patent: 7282305 (2007-10-01), Shoki et al.
patent: 2004/0057107 (2004-03-01), Yun et al.
patent: 2005/0196059 (2005-09-01), Inoue et al.
patent: 7-287389 (1994-04-01), None
patent: 2001-174415 (1999-12-01), None
patent: 2003-114200 (2001-10-01), None
patent: 2005-66781 (2003-08-01), None
patent: 2004-289110 (2003-09-01), None
Tanaka Toshihiko
Terasawa Tsuneo
Tezuka Yoshihiro
A. Marquez, Esq. Juan Carlos
Nguyen Sang
Renesas Technology Corporation
Stites & Harbison PLLC
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