Coating apparatus – With treatment of coating material – By separation
Reexamination Certificate
2011-05-17
2011-05-17
Tadesse, Yewebdar T (Department: 1713)
Coating apparatus
With treatment of coating material
By separation
C118S052000, C118S612000, C118S319000, C118S320000, C118S326000, C118S603000, C118S712000
Reexamination Certificate
active
07942967
ABSTRACT:
A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.
REFERENCES:
patent: 5143552 (1992-09-01), Moriyama
patent: 5472502 (1995-12-01), Batchelder
patent: 5611886 (1997-03-01), Bachman et al.
patent: 5658615 (1997-08-01), Hasebe et al.
patent: 5670210 (1997-09-01), Mandal et al.
patent: 5954878 (1999-09-01), Mandal et al.
patent: 6027760 (2000-02-01), Gurer et al.
patent: 6177133 (2001-01-01), Gurer et al.
patent: 6228561 (2001-05-01), Hasebe et al.
patent: 6238735 (2001-05-01), Mandal et al.
patent: 6248398 (2001-06-01), Talieh et al.
patent: 6261007 (2001-07-01), Takamori et al.
patent: 6317642 (2001-11-01), You et al.
patent: 6327793 (2001-12-01), Gurer et al.
patent: 6548115 (2003-04-01), Gibson et al.
patent: 6798487 (2004-09-01), Ohtani et al.
patent: 7326437 (2008-02-01), Nguyen
patent: 2001/0033895 (2001-10-01), Minami et al.
patent: 2002/0176936 (2002-11-01), Matsuyama
patent: 2003/0003760 (2003-01-01), Kim et al.
patent: 2003/0152875 (2003-08-01), Morales et al.
patent: 0 595 749 (1994-05-01), None
patent: 2-1113 (1990-01-01), None
patent: 11-135427 (1999-05-01), None
patent: WO 02/071153 (2002-09-01), None
patent: WO 02/071154 (2002-09-01), None
patent: PCT/US2004/041203 (2003-12-01), None
Search Report mailed Feb. 9, 2010 for ROC (Taiwan) Patent Application No. 093140590 filed Dec. 24, 2004, 6 pgs.
English Abstract for Taiwan Publication No. TW451079B published Aug. 21, 2001, Nitto Denko Corp, 1 pg.
Notice of Reasons for Rejection mailed Nov. 16, 2009 for Japanese Patent Application No. 2006-547069, 6 pgs.
ASML Holding N.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
Tadesse Yewebdar T
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