Method and system for yield similarity of semiconductor devices

Details Method and system for yield similarity of semiconductor devices Method and system for yield similarity of semiconductor devices

2007-10-23

2007-10-23

Nghiem, Michael P. (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Statistical measurement

Reexamination Certificate

active

11326089

ABSTRACT:
A method and system for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices, providing a second plurality of semiconductor devices, obtaining a first plurality of yields associated with a first yield, and obtaining a second plurality of yields associated with a second yield. Additionally, the method includes performing a first statistical analysis for the first plurality of yields, determining a first statistical distribution, performing a second statistical analysis for the second plurality of yields, and determining a second statistical distribution. Moreover, the method includes processing information associated with the first statistical distribution and the second statistical distribution, and determining an indicator. Also, the method includes processing information associated with the indicator, determining a confidence level, processing information associated with the confidence level, and determining whether the first yield and the second yield are similar.

REFERENCES:
patent: 7024334 (2006-04-01), Wang
patent: 2003/0125903 (2003-07-01), Dobson

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