Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2008-04-15
2008-04-15
Kosowski, Alexander (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S028000, C700S108000, C700S110000
Reexamination Certificate
active
11378833
ABSTRACT:
Provided are a method and a system for virtual metrology in semiconductor manufacturing. Process data and metrology data are received. Prediction data is generated based on the process data and metrology data using a learning control model. The system for virtual metrology in a fabrication facility comprises a fault detection and classification system operable to receive process data, a statistical process control system operable to perform statistical process control on a history of physical metrology data to form metrology data, and a virtual metrology application operable to generate prediction data based on the process data and the metrology data using a learning control model.
REFERENCES:
patent: 6868512 (2005-03-01), Miller et al.
patent: 6917849 (2005-07-01), Pasadyn et al.
patent: 6999836 (2006-02-01), Schwarm et al.
patent: 7198964 (2007-04-01), Cherry et al.
patent: 2005/0071039 (2005-03-01), Mitrovic
patent: 2005/0288812 (2005-12-01), Cheng et al.
patent: 2006/0047356 (2006-03-01), Funk et al.
patent: 2006/0129257 (2006-06-01), Chen et al.
patent: 2007/0260350 (2007-11-01), Zagrebnov
Cheng Chang Yung
Cheng Fan-Tien
Fu Hsueh-Shih
Wang Ying-Lang
Haynes & Boone LLP
Kosowski Alexander
Taiwan Semiconductor Manufacturing Company
LandOfFree
Method and system for virtual metrology in semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and system for virtual metrology in semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for virtual metrology in semiconductor... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3930317