Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2007-11-06
2007-11-06
Norton, Nadine G. (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C216S084000, C134S001300, C430S329000
Reexamination Certificate
active
10906353
ABSTRACT:
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fluorosilicic acid.
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pa
Hansen Brandon
Lowe Marie
Dahimene Mahmoud
Norton Nadine G.
Tokyo Electron Limited
Wood Herron & Evans LLP
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