Method and system for step-and-align interference lithography

Details Method and system for step-and-align interference lithography Method and system for step-and-align interference lithography

2011-06-28

2011-06-28

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07969580

ABSTRACT:
A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography. Besides, the present invention further provides a system for step-and-align interference lithography, which is capable of compensating the positioning error caused by a stepping movement control used for moving a substrate or the light beams in a stepwise manner to form interference-patterned regions by interference lithography and thus the so-generated interference-patterned regions are accurate aligned with one another on a two-dimensional plane for preparing the same to be stitched together to form a two-dimensional large-area periodic structure.

REFERENCES:
patent: 6329104 (2001-12-01), Clube et al.
patent: 6882477 (2005-04-01), Schattenburg et al.

Affiliated with

Also associated with

Rating

Method and system for step-and-align interference lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for step-and-align interference lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for step-and-align interference lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2732241