Optics: measuring and testing – Lamp beam direction or pattern
Patent
1996-12-11
1999-02-23
Font, Frank G.
Optics: measuring and testing
Lamp beam direction or pattern
356402, 356419, G01J 128, G01J 346
Patent
active
058750266
ABSTRACT:
A method and system is disclosed in which the local variation of an extended radiation source is monitored with single-element detector. The chromatic aberration of the imaging optics induces the different transmittance curves for different wavelengths, and the different shape in the transmittance curve is used as a spatial filter which is multiplied to the chromatic intensity profile of the extended radiation source to detect the local variation in the intensity profile of the extended radiation source. The signal processing of the chromatic signals is implemented to detect the size variation and the environmental effects on the extended radiation source. A fiber is also used for remote operation.
REFERENCES:
patent: 4909633 (1990-03-01), Okui et al.
patent: 4992859 (1991-02-01), Yoshida
patent: 5155329 (1992-10-01), Terada et al.
patent: 5206502 (1993-04-01), Gardner
patent: 5278402 (1994-01-01), Wein
patent: 5444236 (1995-08-01), Ludington et al.
patent: 5592285 (1997-01-01), Pund
Kim Cheol-Jung
Kim Kwang-Suk
Font Frank G.
Korea Atomic Energy Research Institute
Smith Zandra V.
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