Method and system for repairing defected photomasks

Details Method and system for repairing defected photomasks Method and system for repairing defected photomasks

2002-12-12

2008-12-02

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000

Reexamination Certificate

active

07459242

ABSTRACT:
A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.

REFERENCES:
patent: 5686206 (1997-11-01), Baum et al.
patent: 6028953 (2000-02-01), Nakamura et al.
patent: 6165649 (2000-12-01), Grenon et al.
patent: 6333485 (2001-12-01), Haight et al.
patent: 6341009 (2002-01-01), O'Conner et al.
patent: 6346352 (2002-02-01), Hayden et al.
patent: 6436602 (2002-08-01), Imahara et al.
patent: 6929886 (2005-08-01), Zait et al.
patent: 2003/0127441 (2003-07-01), Haight et al.
patent: WO 02/16969 (2002-02-01), None
patent: WO 03/022506 (2003-03-01), None
Haight et al, “Implementation and Performance of a Femtosecond Laser Mask Repair System in Manufacturing”, 1998, pp. 477-484.
Haight et al, “MARS: Femtosecond Laser Mask Advanced Repair System in Manufacturing”, Journal of Vacuum Science & Technology B, Nov./Dec. 1999 pp. 3137-3143.

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