Method and system for reducing and monitoring precipitated...

Details Method and system for reducing and monitoring precipitated... Method and system for reducing and monitoring precipitated...

2008-07-22

2008-07-22

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S322000, C134S001000, C134S034000

Reexamination Certificate

active

10787698

ABSTRACT:
A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing a formation of the precipitated defects around the mask reticle caused by photolithography under a light source having a small wavelength.

REFERENCES:
patent: 6279249 (2001-08-01), Dao et al.
patent: 6280886 (2001-08-01), Yan
patent: 6327021 (2001-12-01), Higashiguchi
patent: 6589354 (2003-07-01), Reid
patent: 2002/0083957 (2002-07-01), Reid
patent: 2003/0207182 (2003-11-01), Shirasaki
patent: 2005/0106737 (2005-05-01), Kishkovich et al.
patent: 2006/0201848 (2006-09-01), Lin et al.

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