Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Patent
1995-11-29
1999-06-15
Fourson, George
Semiconductor device manufacturing: process
With measuring or testing
Optical characteristic sensed
36446828, 29 2502, H01L 2166
Patent
active
059131055
ABSTRACT:
Method and system for performing semiconductor manufacturing scratch recognition analysis in cooperation with wafer scanning tools is disclosed. The invention comprises a method for determining from scan data associated with defects or other points on a substrate, such as a semiconductor wafer, what defects comprise part of a scratch. The method comprises, for each cluster of defects, determining whether the cluster includes a minimum number of pixels, or defects. For each cluster comprising the minimum number of defects, determining the best fit line for the cluster, rotating the best fit line about its center of gravity to "fine tune" the fitness thereof, and then calculating the line attributes of the fine tuned best fit line to determine whether the cluster is a scratch and classifying the cluster accordingly.
REFERENCES:
patent: 3751647 (1973-08-01), Maeder et al.
patent: 4579455 (1986-04-01), Levy et al.
patent: 5274434 (1993-12-01), Morioka et al.
patent: 5317380 (1994-05-01), Allemand
patent: 5325443 (1994-06-01), Beatty et al.
patent: 5464779 (1995-11-01), Fujimaki
Bow, S., et al, "Detection of Tiny Scratches . . . Processing System", SPIE, vol. 1153, pp. 121-128, 1989.
Bow, S., et al, "Computerized Detection . . . Crystal Blanks", SPIE vol. 1396, pp. 646-655, 1990.
Brauner, R., et al, "Automated Chip Die Inspection", The International Journal For Hybrid Microelectronics, vol. 4, No. 2, pp. 111-114, Oct. 1981.
Baker, L., et al, "Semiconductor Wafer Inspection", SPIE, vol. 480, pp. 14-21, 1984.
Cohen, E.D., et al "Application of Digital Image Analysis. . . Development", J. of Imaging Science & Technology, 37(2) Mar.-Apr./1993, pp. 133-148.
Bow, S.T. "Detection of Tiny Scratches. . . Image Processing System", Proceedings of the SPIE --The Int'l Soc. for Optical Engineering, 1989 vol. 1153, pp. 121-128 (Abstract Only).
Bow, S.T. "Computerized Detection & Identification of. . . Blanks", Proceedings of the SPIE-- The Int'l Soc. for Optical Engineering (1991) vol. 1396, pp. 646-655 (Abstract Only).
McIntyre Michael
Ngo Thinh
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