Method and system for quantifying the step profile...

Data processing: structural design – modeling – simulation – and em – Modeling by mathematical expression

Reexamination Certificate

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C356S635000, C382S145000

Reexamination Certificate

active

06980937

ABSTRACT:
A method and system for quantifying profile characteristics of semiconductor devices, including receiving profile data for a device under evaluation and isolating from the profile data a region indicating a profile edge. The profile edge data is rotated by ninety degrees to become rotated profile edge data. The non-rotated profile edge data or rotated profile edge data is then used to calculate at least one geometric parameter describing the profile edge.

REFERENCES:
patent: 5283442 (1994-02-01), Martin et al.
patent: 5345309 (1994-09-01), Wertz et al.
patent: 5877092 (1999-03-01), Lee et al.
patent: 5939765 (1999-08-01), Zheng et al.
patent: 6000281 (1999-12-01), Burke
patent: 6009255 (1999-12-01), Shinzawa
patent: 6034409 (2000-03-01), Sakai et al.
patent: 6096629 (2000-08-01), Tsai et al.
patent: 6181411 (2001-01-01), Harris et al.
patent: 6392749 (2002-05-01), Meeks et al.
patent: 6405153 (2002-06-01), Fiekowsky
patent: 6476398 (2002-11-01), Xu et al.
patent: 6563586 (2003-05-01), Stanke et al.
patent: 6849363 (2005-02-01), Ohashi et al.
Bradley, et al., IBM Technical Disclosure Bulletin, Vol. 28, No. 8, Jan., 1986 “Via Sidewall Shaping by Projection Image Degradation”.
G.M. Gut, et al., Research Disclosure, No. 299, Mar., 1989 “Sidewall Angle Reduction of Silicon Features on Semiconductor Wafers”.

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