Method and system for physicochemical analysis using a laser...

Details Method and system for physicochemical analysis using a laser... Method and system for physicochemical analysis using a laser...

2011-05-17

2011-05-17

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

C356S317000, C356S318000

Reexamination Certificate

active

07944558

ABSTRACT:
A method for physicochemical analysis of a material during its ablation with a pulsed laser. The method uses the ratio of intensity levels of two emission lines of a tracer element derived from plasma generated by the laser beam to characterize the plasma excitation temperature. The method determines concentration of an element to be measured in the plasma using standard measurements indicating correspondence between a concentration of the element to measured and a variation of intensity of an emission line and different ratios between intensity levels of two emission lines of the tracer element, the ratios representing the plasma temperature.

REFERENCES:
patent: 4690558 (1987-09-01), Tsunoyama et al.
patent: 5715053 (1998-02-01), Loge
patent: 5991020 (1999-11-01), Loge
patent: 6008896 (1999-12-01), Sabsabi et al.
patent: WO 99/49301 (1999-09-01), None
C. Chaleard, et al., “Correction of Matrix Effects in Quantitative Elemental Analysis With Laser Ablation Optical Emission Spectrometry”, Journal of Analytical Atomic Spectrometry, XP 009019037, vol. 12, No. 2, Feb. 1997, pp. 183-188.

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