Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2011-01-25
2011-01-25
Decady, Albert (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S110000, C438S008000, C438S009000, C438S072000, C438S680000, C438S689000, C438S694000, C216S073000, C216S059000, C430S316000, C430S030000, C430S311000
Reexamination Certificate
active
07877161
ABSTRACT:
A processing system and method for chemical oxide removal (COR) is presented, wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, such as HF/NH3, under controlled conditions including surface temperature and gas pressure. The second treatment chamber comprises a heat treatment chamber that provides a temperature controlled chamber, thermally insulated from the chemical treatment chamber. The heat treatment chamber provides a substrate holder for controlling the temperature of the substrate to thermally process the chemically treated surfaces on the substrate.
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Chen Lemuel
Funk Merritt Lane
Iwami Akira
Odagiri Masaya
Pinto Kevin Augustine
De'cady Albert
Lopez Olvin
Tokyo Electron Limited
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